Luminescent Technologies Inc. (Luminescent), the leading provider of Computational Metrology and Inspection solutions for the global semiconductor manufacturing industry and Dai Nippon Printing Company, Ltd. (DNP) announced today the successful completion of the first phase of a three (3)-year joint development program for computational metrology and inspection using Luminescent's Automated Image Processing Hub (LAIPH) platform. The goals of the collaboration are to dramatically reduce photomask defect review and analysis cycle time while simultaneously improving overall mask quality. The first phase resulted in the successful implementation of LAIPH Aerial Image Analyzer (AIA) software in DNP's Kami-Fukuoka photomask production plant.
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